File:Photolithography etching process.svg
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![File:Photolithography etching process.svg](http://upload.wikimedia.org/wikipedia/commons/thumb/b/b0/Photolithography_etching_process.svg/120px-Photolithography_etching_process.svg.png)
Size of this PNG preview of this SVG file: 120 × 600 pixels. Other resolutions: 48 × 240 pixels | 96 × 480 pixels | 153 × 768 pixels | 204 × 1,024 pixels | 409 × 2,048 pixels | 512 × 2,560 pixels.
Original file (SVG file, nominally 512 × 2,560 pixels, file size: 8 KB)
File history
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Date/Time | Thumbnail | Dimensions | User | Comment | |
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current | 08:27, 17 April 2022 | ![]() | 512 × 2,560 (8 KB) | Djiboun | File uploaded using svgtranslate tool (https://svgtranslate.toolforge.org/). Added translation for fr. |
13:18, 20 June 2020 | ![]() | 512 × 2,560 (5 KB) | Mega deppa | Reverted to version as of 16:52, 9 October 2011 (UTC) | |
13:16, 20 June 2020 | ![]() | 512 × 2,560 (8 KB) | Mega deppa | File uploaded using svgtranslate tool (https://svgtranslate.toolforge.org/). Added translation for ja. | |
16:52, 9 October 2011 | ![]() | 512 × 2,560 (5 KB) | Cmglee | Align text, change enumeration and change colour to match Image:CMOS_fabrication_process.svg. | |
22:03, 30 September 2011 | ![]() | 512 × 2,560 (5 KB) | Cmglee | Merge develop and remove exposed photoresist. | |
22:46, 29 September 2011 | ![]() | 512 × 2,926 (5 KB) | Cmglee | Fix text alignment. | |
22:39, 29 September 2011 | ![]() | 512 × 2,926 (5 KB) | Cmglee | Fix text alignment. | |
22:37, 29 September 2011 | ![]() | 512 × 2,926 (5 KB) | Cmglee | Fix text alignment. | |
22:30, 29 September 2011 | ![]() | 512 × 3,413 (5 KB) | Cmglee | {{Information |Description ={{en|1=Simplified illustration of dry etching using positive photoresist during a photolithography process in semiconductor microfabrication. }} |Source ={{own}} |Author =Cmglee |Date |
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