10 µm process

Source: Wikipedia, the free encyclopedia.

The 10 μm process (10 micron smallest dimension) is the level of MOSFET semiconductor process technology that was commercially reached around 1971,[1][2] by leading semiconductor companies such as RCA and Intel.

Products featuring 10 μm manufacturing process

References

  1. ^ Mueller, S (21 July 2006). "Microprocessors from 1971 to the Present". informIT. Retrieved 11 May 2012.
  2. ^ Myslewski, R (15 November 2011). "Happy 40th birthday, Intel 4004!". TheRegister. Archived from the original on 19 April 2015. Retrieved 19 April 2015.
  3. ^ Lojek, Bo (2007). History of Semiconductor Engineering. Springer Science & Business Media. p. 330. ISBN 9783540342588.
  4. ^ Lojek, Bo (2007). History of Semiconductor Engineering. Springer Science & Business Media. pp. 362–363. ISBN 9783540342588. The i1103 was manufactured on a 6-mask silicon-gate P-MOS process with 8 μm minimum features. The resulting product had a 2,400 μm, 2 memory cell size, a die size just under 10 mm2, and sold for around $21.
  5. ^ a b "History of the Intel Microprocessor - Listoid". Archived from the original on 27 April 2015. Retrieved 19 April 2015.

External links

Preceded by
20 μm process
MOSFET semiconductor device fabrication process Succeeded by
6 μm process